Compact ORP Measurement for Harsh Processes
The CPF82E is designed for ORP measurement where the process conditions are more demanding than standard water applications. It is particularly suited to industrial water and wastewater treatment, mining, minerals and metal processing.
The integrated assembly keeps the measuring point compact while providing a straightforward installation with an NPT 3/4" process connection.
Robust Reference System
The CPF82E uses a gel-filled compact electrode with a double-chamber reference system, potassium nitrate bridge electrolyte and a PTFE diaphragm. The platinum ring serves as the ORP measuring electrode.
The large, dirt-repellent PTFE junction helps reduce maintenance requirements in applications where contamination can affect conventional electrodes.
Memosens 2.0 Digital Technology
With Memosens 2.0, measurement data is transferred digitally between the sensor and transmitter. The sensor can also store calibration and process information, making it possible to calibrate the sensor away from the measuring point and then install it back into the process.
This is especially useful when sensor replacement and maintenance need to be handled efficiently.
Designed for Mining and Wastewater
The CPF82E is intended for demanding applications including neutralization, flotation, leaching and inlet/outlet monitoring. Its compact construction and resistance to contamination make it suitable for process environments where conventional ORP sensors may require frequent maintenance.
Key Features
Digital ORP / Redox sensor
Memosens 2.0 digital technology
Measuring range: -1500 to +1500 mV
Compact integrated assembly
Platinum ring ORP electrode
Double-chamber reference system
Potassium nitrate bridge electrolyte
Dirt-repellent PTFE diaphragm
PPS sensor housing
NPT 3/4" process connection
Process temperature: 0 to 80°C
Process pressure: 1 to 10 bar abs at 80°C
Integrated NTC temperature sensor
IP68 ingress protection
Optional hazardous-area certification
Suitable for abrasive and demanding process environments
Typical Applications
Industrial Wastewater Treatment
For ORP monitoring at wastewater treatment process points, including inlet, outlet and neutralization processes.
Mining
Suitable for redox measurement in demanding mining processes where media contamination and harsh conditions can affect sensor performance.
Mineral Processing
Useful for flotation and leaching processes where ORP measurement is an important process parameter.
Metal Processing
Suitable for ORP monitoring in metal-related processes and associated water treatment systems.
Neutralization
Used to monitor redox conditions during chemical treatment and neutralization processes.
Inlet and Outlet Monitoring
Can be installed at process inlet and outlet points to monitor changes in oxidation-reduction conditions.
FAQ
What is the Endress+Hauser CPF82E?
The CPF82E is a compact digital ORP sensor for measuring oxidation-reduction potential in demanding industrial applications. It uses Memosens 2.0 technology.
What is the measuring range of the CPF82E?
The CPF82E has an ORP measuring range of -1500 to +1500 mV.
What is the difference between CPF81E and CPF82E?
The CPF81E is a digital pH sensor, while the CPF82E is a digital ORP sensor. Both are compact Memosens sensors designed for demanding applications such as wastewater treatment and mining.
What is the process temperature range?
The CPF82E is specified for process temperatures from 0 to 80°C.
What is the process connection?
The CPF82E uses an NPT 3/4" process connection and a Memosens plug connection.
Is the CPF82E suitable for mining applications?
Yes. Endress+Hauser specifically lists mining, minerals and metal industries, including flotation and leaching, among the applications for the CPF82E.
Does the CPF82E use Memosens 2.0?
Yes. Memosens 2.0 provides digital communication and allows calibration and process data to be stored with the sensor.
Can the CPF82E be used in hazardous areas?
An optional FM IS/NI Class I Division 1 & 2, Groups A-D certification is available. The exact approval depends on the selected configuration.