Endress+Hauser Memosens CPF82E Compact Digital ORP Sensor

$550.00


The Endress+Hauser Memosens CPF82E is a compact digital ORP sensor designed for reliable redox measurement in harsh process environments. Its robust construction, dirt-repellent PTFE junction and integrated assembly make it well suited to abrasive and demanding applications such as industrial wastewater treatment, flotation, leaching and neutralization. With Memosens 2.0 technology, the sensor provides secure digital data transmission and stores calibration and process information for easier sensor management.

🕑 Lead time: 6-8 weeks
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Compact ORP Measurement for Harsh Processes

The CPF82E is designed for ORP measurement where the process conditions are more demanding than standard water applications. It is particularly suited to industrial water and wastewater treatment, mining, minerals and metal processing.

The integrated assembly keeps the measuring point compact while providing a straightforward installation with an NPT 3/4" process connection.

Robust Reference System

The CPF82E uses a gel-filled compact electrode with a double-chamber reference system, potassium nitrate bridge electrolyte and a PTFE diaphragm. The platinum ring serves as the ORP measuring electrode.

The large, dirt-repellent PTFE junction helps reduce maintenance requirements in applications where contamination can affect conventional electrodes.

Memosens 2.0 Digital Technology

With Memosens 2.0, measurement data is transferred digitally between the sensor and transmitter. The sensor can also store calibration and process information, making it possible to calibrate the sensor away from the measuring point and then install it back into the process.

This is especially useful when sensor replacement and maintenance need to be handled efficiently.

Designed for Mining and Wastewater

The CPF82E is intended for demanding applications including neutralization, flotation, leaching and inlet/outlet monitoring. Its compact construction and resistance to contamination make it suitable for process environments where conventional ORP sensors may require frequent maintenance.

Key Features


  • Digital ORP / Redox sensor

  • Memosens 2.0 digital technology

  • Measuring range: -1500 to +1500 mV

  • Compact integrated assembly

  • Platinum ring ORP electrode

  • Double-chamber reference system

  • Potassium nitrate bridge electrolyte

  • Dirt-repellent PTFE diaphragm

  • PPS sensor housing

  • NPT 3/4" process connection

  • Process temperature: 0 to 80°C

  • Process pressure: 1 to 10 bar abs at 80°C

  • Integrated NTC temperature sensor

  • IP68 ingress protection

  • Optional hazardous-area certification

  • Suitable for abrasive and demanding process environments

Typical Applications

Industrial Wastewater Treatment

For ORP monitoring at wastewater treatment process points, including inlet, outlet and neutralization processes.

Mining

Suitable for redox measurement in demanding mining processes where media contamination and harsh conditions can affect sensor performance.

Mineral Processing

Useful for flotation and leaching processes where ORP measurement is an important process parameter.

Metal Processing

Suitable for ORP monitoring in metal-related processes and associated water treatment systems.

Neutralization

Used to monitor redox conditions during chemical treatment and neutralization processes.

Inlet and Outlet Monitoring

Can be installed at process inlet and outlet points to monitor changes in oxidation-reduction conditions.

FAQ

What is the Endress+Hauser CPF82E?

The CPF82E is a compact digital ORP sensor for measuring oxidation-reduction potential in demanding industrial applications. It uses Memosens 2.0 technology.

What is the measuring range of the CPF82E?

The CPF82E has an ORP measuring range of -1500 to +1500 mV.

What is the difference between CPF81E and CPF82E?

The CPF81E is a digital pH sensor, while the CPF82E is a digital ORP sensor. Both are compact Memosens sensors designed for demanding applications such as wastewater treatment and mining.

What is the process temperature range?

The CPF82E is specified for process temperatures from 0 to 80°C.

What is the process connection?

The CPF82E uses an NPT 3/4" process connection and a Memosens plug connection.

Is the CPF82E suitable for mining applications?

Yes. Endress+Hauser specifically lists mining, minerals and metal industries, including flotation and leaching, among the applications for the CPF82E.

Does the CPF82E use Memosens 2.0?

Yes. Memosens 2.0 provides digital communication and allows calibration and process data to be stored with the sensor.

Can the CPF82E be used in hazardous areas?

An optional FM IS/NI Class I Division 1 & 2, Groups A-D certification is available. The exact approval depends on the selected configuration.

Measuring Principle
Measuring principleSensor ORP / redox
Electrode principleGel-compact electrode with double chamber reference system, potassium nitrate bridge electrolyte and PTFE diaphragm, platinum ring
CharacteristicResistant against electrolyte poisoning and dirt repellent gel electrode including process connection NPT 3/4"
Application
ApplicationFlotation, leaching, neutralization, outlet monitoring
Measuring Range
Measuring range-1500 mV to +1500 mV
Design & Materials
DesignCompact electrode in PPS housing with NPT 3/4" process connection
HousingPPS
ORP electrodePlatinum ring
Double chamber reference systemKNO₃ and KCl/AgCl
Diameter22 mm (0.87 inch)
Length150 mm (5.91 inch)
Process Conditions
Process temperature0 to 80 °C (32 to 170 °F)
Process pressure1 to 10 bar abs. at 80 °C (15 to 145 psi abs. at 176 °F)
Sensor & Connection
Temperature sensorNTC
Process connectionNPT 3/4"
ConnectionMemosens plug
Ingress protectionIP68
Certificates & Approvals
Ex certification(optional) FM IS NI Cl. I Div. 1 & 2, Groups A-D